DocumentCode :
2906250
Title :
Two orders of magnitude leakage power reduction of low voltage SRAMs by row-by-row dynamic Vdd control (RRDV) scheme
Author :
Kanda, Kouichi ; Miyazaki, Takayuki ; Sik, Min Kyeong ; Kawaguchi, Hiroshi ; Sakurai, Takayasu
Author_Institution :
Inst. of Ind. Sci., Univ. of Tokyo, Japan
fYear :
2002
fDate :
25-28 Sept. 2002
Firstpage :
381
Lastpage :
385
Abstract :
A novel SRAM scheme is proposed that can reduce the active leakage power by two orders of magnitude. In the low voltage region of less than 1 V, the VTH, VTH, is lowered to less than 0.2 V and the leakage power of memory cells becomes a dominant issue. By dynamically dropping the supply voltage of un-accessed cells row by row, the cell leakage can be reduced exponentially through the drain induced barrier lowering (DIBL) effect. Additionally, to lower the leakage from bit-line through transfer gates of memory cells, un-accessed word lines are applied with a negative voltage together with a reduced swing write technique. The basic advantage is verified by measurement and the effectiveness in future generations is discussed by simulations.
Keywords :
SRAM chips; circuit simulation; integrated circuit design; integrated circuit modelling; leakage currents; logic design; logic simulation; low-power electronics; 0.2 V; 1 V; DIBL effect; bit-line/transfer gate leakage; drain induced barrier lowering effect; leakage power reduction; low voltage SRAM; low voltage operating regions; memory cell active leakage power; negative voltage applied un-accessed word lines; reduced swing write techniques; row-by-row dynamic control schemes; un-accessed cell supply voltage dropping; Delay; Fabrics; Industrial control; Leakage current; Low voltage; Maintenance; Random access memory; Threshold voltage; Virtual manufacturing; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
ASIC/SOC Conference, 2002. 15th Annual IEEE International
Print_ISBN :
0-7803-7494-0
Type :
conf
DOI :
10.1109/ASIC.2002.1158089
Filename :
1158089
Link To Document :
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