DocumentCode :
2906418
Title :
Gate Failures Effectively Shape Multiplexing
Author :
Beiu, V. ; Ibrahim, W. ; Alkhawwar, Y.A. ; Sulieman, M.H.
Author_Institution :
United Arab Emirates Univ., Al Ain
fYear :
2006
fDate :
4-6 Oct. 2006
Firstpage :
29
Lastpage :
40
Abstract :
This paper investigates the behavior of multiplexing (MUX) schemes in combination with the elementary gates. The two schemes under investigation are majority (MAJ) and NAND MUX. The simulation results presented here are for single-electron technology, but could easily be extended to CMOS. The components of the gates have been subjected only to geometric variations. Firstly, the gates and the two MUX schemes are analyzed theoretically. Secondly, simulations using probability transfer matrices (PTM) allow evaluating both MUX schemes at a redundancy factor R = 6. Finally, the gates are compared in terms of their intrinsic probability of failure (with respect to geometric variations), and the two MUX schemes are weighted against the reliability enhancements they are bringing into the system. By comparing the simulation results from PTM with the ones based on (geometric) variations, this study gives deeper insights into the behavior of MUX schemes, and show that the gates play a major role, strongly affecting MUX systems
Keywords :
CMOS integrated circuits; Monte Carlo methods; NAND circuits; failure analysis; integrated circuit reliability; logic gates; logic testing; matrix algebra; multiplexing; probability; redundancy; single electron devices; CMOS; NAND MUX; elementary gates; failure intrinsic probability; gate failures; geometric variations; majority MUX; multiplexing schemes; probability transfer matrices; redundancy; reliability enhancements; single-electron technology; CMOS technology; Circuit simulation; Nanoscale devices; Performance analysis; Power dissipation; Power system reliability; Redundancy; Shape; Solid modeling; Uncertainty;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Defect and Fault Tolerance in VLSI Systems, 2006. DFT '06. 21st IEEE International Symposium on
Conference_Location :
Arlington, VA
ISSN :
1550-5774
Print_ISBN :
0-7695-2706-X
Type :
conf
DOI :
10.1109/DFT.2006.33
Filename :
4030913
Link To Document :
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