DocumentCode :
2907743
Title :
TCAD simulations on CMOS propagation induced pulse broadening effect: Dependence analysis on the NMOS VT
Author :
Mogollón, J.M. ; Palomo, F.R. ; Aguirre, M.A. ; Nápoles, J. ; Guzmán-Miranda, H. ; García-Sánchez, E.
Author_Institution :
Dept. of Electron. Eng., Univ. of Sevilla, Sevilla, Spain
fYear :
2009
fDate :
14-18 Sept. 2009
Firstpage :
574
Lastpage :
579
Abstract :
Propagation Induced Pulse Broadening (PIPB) effect is becoming a major concern for electronic designers since new technologies are fast enough to propagate and capture Single Event Transients(SET). In this paper we explore the influence of the threshold voltage VT on PIPB effect by simulating the propagation of a SET through a self-feedback chain of CMOS inverters. The conclusions outlined are applicable when designing with Multi-Vt nanometric CMOS technologies.
Keywords :
CMOS integrated circuits; electronic engineering computing; technology CAD (electronics); NMOS; TCAD simulations; dependence analysis; electronic designers; nanometric CMOS technologies; propagation induced pulse broadening effect; self-feedback chain; single event transients; threshold voltage; Doping; Inverters; SPICE; Semiconductor device modeling; Semiconductor process modeling; Transient analysis; Vehicles;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Radiation and Its Effects on Components and Systems (RADECS), 2009 European Conference on
Conference_Location :
Bruges
ISSN :
0379-6566
Print_ISBN :
978-1-4577-0492-5
Electronic_ISBN :
0379-6566
Type :
conf
DOI :
10.1109/RADECS.2009.5994717
Filename :
5994717
Link To Document :
بازگشت