DocumentCode :
2907790
Title :
High reliable, low threshold 1.3 μm SL-QW PACIS (p-substrate Al-oxide Confined Inner Stripe) laser array
Author :
Iwai, N. ; Mukaihara, T. ; Yamanaka, N. ; Itoh, M. ; Arakawa, S. ; Shimizu, H. ; Kasukawa, A.
Author_Institution :
Yokohama R&D Lab., Furukawa Electr. Co. Ltd., Japan
fYear :
1999
fDate :
1999
Firstpage :
219
Lastpage :
222
Abstract :
A 1.3 μm Al-oxide confined inner stripe laser on p-InP substrate (PACIS) has been demonstrated for low cost laser array application. First, we have investigated the oxidation rate of Alx In1-xAs layer grown on InP substrate. The optimum conditions were found to be oxidation temperature=500°C, layer thickness=100 nm, and Al-contents=0.48 (lattice-match) taking oxidation rate and surface morphology into account. The 50 nm-thick Al0.48 In0.52As-oxide layer provides good current blocking for laser applications. Based on the above investigations, the fabricated PACIS laser shows a low threshold current of 4.0 mA and a high slope efficiency of 0.6 W/A. We have also confirmed high reliability under driving time over 3,000 hours at 85°C, 5 mW. A 22-channel laser array consisted of PACIS structure have the average threshold current of 3.98 mA and the standard deviation of 0.42 mA
Keywords :
III-V semiconductors; aluminium compounds; indium compounds; oxidation; quantum well lasers; semiconductor laser arrays; 1.3 mum; 100 nm; 3.98 mA; 4.0 mA; 5 mW; 50 nm; 500 degC; 85 degC; Al-contents; AlxIn1-xAs layer; AlInAs-InP; InP; current blocking; high reliability; high reliable low threshold 1.3 μm SL-QW PACIS; high slope efficiency; layer thickness; low cost laser array application; low threshold current; optimum conditions; oxidation rate; oxidation temperature; p-InP substrate; p-substrate Al-oxide confined inner stripe laser array; surface morphology; Chemical lasers; Indium phosphide; Laser applications; Nitrogen; Optical arrays; Optical microscopy; Oxidation; Surface morphology; Temperature; Threshold current;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1999. IPRM. 1999 Eleventh International Conference on
Conference_Location :
Davos
ISSN :
1092-8669
Print_ISBN :
0-7803-5562-8
Type :
conf
DOI :
10.1109/ICIPRM.1999.773674
Filename :
773674
Link To Document :
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