DocumentCode :
2907840
Title :
Wafer bonding: a flexible approach to materials integration
Author :
Gosele, U. ; Kastner, G. ; Senz, S. ; Kopperschmidt, P. ; Plossl, A. ; Scholz, R. ; Tong, Q.-Y. ; Chao, Y.-L. ; Huang, L.-J.
Author_Institution :
Max-Planck Inst. of Microstruct. Phys., Halle, Germany
fYear :
1999
fDate :
1999
Firstpage :
231
Abstract :
“Wafer bonding” refers to the phenomenon that mirror-polished, flat and clean surfaces of almost any material, when brought into contact at room temperature, are locally attracted to each other by van-der-Waals forces and adhere or bond to each other. Semiconductor wafer bonding has increasingly become a technology of choice for materials integration in microelectronics, optoelectronics, and microelectromechanical systems (MEMS). The presentation gives an overview of the fundamentals of wafer bonding and discusses the different approaches used for silicon wafers (usually bonded at room temperature in air) and for III-V compound wafers (often bonded at elevated temperatures around 500°C in hydrogen). A critical assessment is given of so-called “universal compliant substrates” fabricated by twist wafer bonding, which are supposed to allow heteroepitaxial growth of materials with large misfit without the generation of threading dislocations
Keywords :
wafer bonding; heteroepitaxial growth; materials integration; mirror-polished flat clean surfaces; threading dislocations; wafer bonding; Bonding forces; III-V semiconductor materials; Microelectromechanical systems; Microelectronics; Micromechanical devices; Semiconductor materials; Silicon; Surface cleaning; Temperature; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1999. IPRM. 1999 Eleventh International Conference on
Conference_Location :
Davos
ISSN :
1092-8669
Print_ISBN :
0-7803-5562-8
Type :
conf
DOI :
10.1109/ICIPRM.1999.773677
Filename :
773677
Link To Document :
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