DocumentCode :
2908247
Title :
Improvement of Self-heating Effects in Nanoscale Multi-substrate Contact Field-effect Transistors
Author :
Eng, Yi-Chuen ; Lin, Jyi-Tsong
Author_Institution :
Nat. Sun Yat-Sen Univ., Kaohsiung
fYear :
2007
fDate :
26-28 Sept. 2007
Firstpage :
45
Lastpage :
48
Abstract :
One of the key issues that block the development of silicon-on-insulator (SOI) CMOS technology is so-called self-heating effects (SHEs). In this paper, we have investigated the electrical characteristics of multi-substrate contact field-effect transistors (MSCFETs) depend on the gate length for the first time. The proposed structure of MSCFET can significantly diminish the thermal instability occurred in the channel region, chiefly owing to the substrate contacts. Additionally, due to the presence of the block oxide at the side of the Si-body, the short-channel effects (SCEs) can also be well controlled resulting in improved performance.
Keywords :
CMOS integrated circuits; field effect transistors; nanoelectronics; silicon-on-insulator; thermal stability; MSCFET; Si; multisubstrate contact field-effect transistors; nanoscale transistors; self-heating effects; short-channel effects; silicon-on-insulator CMOS technology; substrate contacts; thermal instability; CMOS technology; Chemical vapor deposition; Contacts; Electric variables; FETs; Hot carrier injection; Lithography; MOSFETs; Silicon devices; Silicon on insulator technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Circuits, 2007. ISIC '07. International Symposium on
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-0797-2
Electronic_ISBN :
978-1-4244-0797-2
Type :
conf
DOI :
10.1109/ISICIR.2007.4441792
Filename :
4441792
Link To Document :
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