DocumentCode
2909043
Title
Length dependence of quantized conductance in etched GaAs/AlGaAs quantum wires
Author
Worschech, L. ; Beuscher, F. ; Forchel, A. ; Kristensen, A. ; Lindelof, P.E. ; Sorensen, C.B.
Author_Institution
Dept. of Tech. Phys., Wurzburg Univ., Germany
fYear
1999
fDate
1999
Firstpage
527
Lastpage
530
Abstract
Quantum wires with strong lateral confinement fabricated by high resolution electron beam lithography and wet chemical etching show conductance quantization up to a length comparable to the mean free path of the electrons associated with respective 2DEGs. By the temperature dependence of the quantized conductance an energy-spacing, ΔE1D=12.5±0.5 meV, between the two lowest lying 1D subbands for 135 nm wide wires was found-about 5 times larger than in commonly used split-gate devices. The breakdown of conductance quantization with increasing wire length is studied for quantum wires fabricated from wafers with different mobilities between 0.05×10 6 and 2×106 cm2Ns. Our results support the suggestion by Koester et al. (1996), that backscattering is suppressed in strongly confined quantum wires, where the 1D subband energy spacing is much larger than the random potential fluctuations in the sample
Keywords
III-V semiconductors; aluminium compounds; electron beam lithography; etching; gallium arsenide; interface states; quantum interference phenomena; semiconductor quantum wires; two-dimensional electron gas; 1D subbands; 2DEG; GaAs-AlGaAs; backscattering; conductance quantization; electron mean free path; energy-spacing; etched GaAs/AlGaAs quantum wires; high resolution electron beam lithography; length dependence; mobilities; quantized conductance; random potential fluctuations; split-gate devices; strong lateral confinement; strongly confined quantum wires; temperature dependence; wet chemical etching; wire length; Chemicals; Electron beams; Energy resolution; Gallium arsenide; Lithography; Quantization; Split gate flash memory cells; Temperature dependence; Wet etching; Wires;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 1999. IPRM. 1999 Eleventh International Conference on
Conference_Location
Davos
ISSN
1092-8669
Print_ISBN
0-7803-5562-8
Type
conf
DOI
10.1109/ICIPRM.1999.773749
Filename
773749
Link To Document