Electric field and plasma potential measurements on TEXT-U using the 2 MeV heavy ion beam probe (HIBP)

Author

McLaren, P.E. ; Demers, D.R. ; Schoch, P.M. ; Ouroua, A. ; Conner, K.A. ; Crowley, T.P. ; Hickok

Author_Institution

Rensselaer Polytech. Inst., Troy, NY, USA

fYear

1996

fDate

3-5 June 1996

Firstpage

114

Abstract

Summary form only given, as follows. The 2 MeV HIBP on TEXT-Upgrade has been used to measure the plasma potential for a variety of discharge conditions. Small scale, multiple point measurements throughout a cross section of the plasma give variations in electric field with a resolution of better than 10 V/cm. Scan lines through the plasma produce a potential profile along a radial path from plasma center to edge. Changes in electric field and potential are monitored during impurity injection and with 500 kW of ECH heating. Fluctuations in plasma potential have been observed deep within the plasma with 40 V rms sensitivity.

Keywords

plasma toroidal confinement; HIBP; TEXT-U; cross section; electric field measurements; heavy ion beam probe; impurity injection; plasma fluctuations; plasma potential measurements; potential profile; small scale multiple point measurements; Electric potential; Electric variables measurement; Fluctuations; Impurities; Ion beams; Monitoring; Plasma diagnostics; Plasma measurements; Probes; Resistance heating;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on

Conference_Location

Boston, MA, USA

ISSN

0730-9244

Print_ISBN

0-7803-3322-5

Type

conf

DOI

10.1109/PLASMA.1996.550252

Filename

550252