Title :
Ethanethiol Removal Using a Novel Plasma Reactor Combined with Mn/?-Al2O3
Author :
Lu, Bin ; Ji, Min ; Wang, Mengmeng ; Lv, Jianbo
Author_Institution :
Sch. of Environ. Sci. & Eng., Tianjin Univ., Tianjin, China
Abstract :
This study is to develop a hybrid technology of plasma and catalysis for odor control. Reactive species were generated from the three types of plasma discharge, such as pulsed corona discharge, dielectric barrier discharge (DBD) and hybrid discharge (pulsed corona discharge and DBD plasma occurring together), driven by a self-made pulsed high voltage power supply. Ethanethiol was selected as treated target malodorant. The effects of three various types of discharges on ethanethiol removal rate and energy efficiency were investigated. Then, plasma catalytic oxidation of ethanethiol using gamma-Al2O3, Mn/gamma-Al2O3 as catalysts was also estimated by the corresponding enhanced ethanethiol removal rate and energy efficiency. The results showed that the ethanethiol removal rate increased with increasing applied voltage but energy efficiency had a maximum with increasing applied voltage under three various types of discharges. When using corona discharge with catalysts, the maximum energy efficiency and the corresponding ethanethiol removal rate were 20 % and 30 g/kWh at 5 J/L, respectively. The mechanism of catalytic oxidation of ethanethiol was also discussed.
Keywords :
air pollution; alumina; catalysis; chemical reactors; oxidation; sewage treatment; Al2O3; catalysis; dielectric barrier discharge; ethanethiol removal; malodorant; odor control; plasma catalytic oxidation; plasma reactor; pulsed corona discharge; Corona; Energy efficiency; Hybrid power systems; Inductors; Oxidation; Plasmas; Power generation; Pulse generation; Pulsed power supplies; Voltage; catalysts; corona discharge; ethanethiol; nonthermal plasma;
Conference_Titel :
Environmental Science and Information Application Technology, 2009. ESIAT 2009. International Conference on
Conference_Location :
Wuhan
Print_ISBN :
978-0-7695-3682-8
DOI :
10.1109/ESIAT.2009.94