Title :
Investigation of surface properties on Indium Thin Oxide films modified by MirroTron Sputtering system
Author :
Mungkung, N. ; Yuji, T. ; Nakabayashi, K. ; Kataoka, H. ; Suzaki, Y. ; Toya, H. ; Shibata, H.
Author_Institution :
Dept. of Electr. Technol. Educ., King Mongkut´´s Univ. of Technol. Thonburi, Bangkok, Thailand
fDate :
Aug. 30 2010-Sept. 3 2010
Abstract :
Indium Tin Oxide (ITO) film is evaporated on the PEN film using MirrorTron Sputtering system, which is a new sputtering system enabling sputter deposition at a low temperature, separating a sputtering chamber and a deposition chamber. As a result, a uniform ITO thin-film deposition with a film thickness of 150 nm is enabled. This ITO thin-film is chemically analyzed using Focused ion beam and X-ray photoelectron spectroscopy. As a result, good thin-film condition is confirmed.
Keywords :
X-ray photoelectron spectra; chemical analysis; focused ion beam technology; indium compounds; semiconductor growth; semiconductor materials; semiconductor thin films; sputter deposition; tin compounds; InSnO; PEN film; X-ray photoelectron spectroscopy; chemical analysis; deposition chamber; film thickness; focused ion beam; indium thin oxide films; mirrotron sputtering system; size 150 nm; sputter deposition; sputtering chamber; surface properties; thin-film condition; uniform ITO thin-film deposition; Films; Indium tin oxide; Photovoltaic cells; Plasmas; Sputtering; Substrates;
Conference_Titel :
Discharges and Electrical Insulation in Vacuum (ISDEIV), 2010 24th International Symposium on
Conference_Location :
Braunschweig
Print_ISBN :
978-1-4244-8367-9
Electronic_ISBN :
1093-2941
DOI :
10.1109/DEIV.2010.5625759
