DocumentCode :
2912711
Title :
Destruction of volatile organic compounds in air by a superimposed barrier discharge plasma reactor and activated carbon filter hybrid system
Author :
Urashima, K. ; Chang, J.S. ; Ito, T.
Author_Institution :
Dept. of Eng. Phys., McMaster Univ., Hamilton, Ont., Canada
Volume :
3
fYear :
1997
fDate :
5-9 Oct 1997
Firstpage :
1969
Abstract :
The superimposed barrier discharge and activated carbon filter hybrid systems are used to remove toluene and trichloro-ethylene (TCE) from air streams. The superimposed barrier discharge consists of silent and surface discharges. Experiments are conducted for the gas flow rate from 1 to 10 L/min., applied power from 0 to 7 W and toluene and TCE initial concentration from 0 to 2,000 ppm for 60 Hz AC applied voltage conditions. Discharge byproducts are measured by FTIR, GC and TLV VOC detector. The results shows that: (1) toluene decomposition rate monotonically increases with increasing applied power; (2) approximately 90% of toluene is removed by plasma reactors alone and up to 98% is removed by hybrid systems; (3) TCE removal rate by hybrid system is 90% and up to 50% is removed by a discharge reactor alone; (4) the pressure drop of the reactor and carbon filter increase with increasing gas flow rate; (5) TCE decomposition to form CO2, H2O and Cl2 and except CO2 and H2O these discharge byproducts are absorbed in activated carbon filters; (6) no COCl2, HCl, CO, NOx and O3 are observed in a discharge byproducts for the present range of experiments; and (7) the energy yield for toluene decompositions is up to 30 g/kWh, and up to 15 g/kWh for TCE decompositions
Keywords :
air pollution control; decomposition; discharges (electric); filtration; health hazards; plasma devices; 0 to 7 W; 60 Hz; activated carbon filter; air emissions control; decomposition rate; discharge byproducts; silent discharges; superimposed barrier discharge plasma reactor; surface discharges; toluene removal; trichloro-ethylene removal; volatile organic compounds destruction; Atmospheric-pressure plasmas; Filters; Inductors; Organic compounds; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma sources; Plasma temperature; Volatile organic compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Industry Applications Conference, 1997. Thirty-Second IAS Annual Meeting, IAS '97., Conference Record of the 1997 IEEE
Conference_Location :
New Orleans, LA
ISSN :
0197-2618
Print_ISBN :
0-7803-4067-1
Type :
conf
DOI :
10.1109/IAS.1997.626330
Filename :
626330
Link To Document :
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