DocumentCode :
2913489
Title :
Monte Carlo simulation of the breakdown in copper vapour at low pressure
Author :
Loffhagen, Detlef ; Uhrlandt, Dirk ; Hencken, Kai
Author_Institution :
Leibniz Inst. for Plasma Sci. & Technol. (INP), Greifswald, Germany
fYear :
2010
fDate :
Aug. 30 2010-Sept. 3 2010
Firstpage :
7
Lastpage :
10
Abstract :
The breakdown conditions of copper vapour at low pressure are studied in a Monte Carlo simulation of electrons, copper ions and fast copper atoms. This is of interest for the dielectric breakdown strength of a vacuum interrupter after current zero, where hot vapour is still emitted from the electrodes. A one-dimensional model with given voltage drops in the kV range is applied to study the charge carrier multiplication in the gap. Initiated by the thermionic emission the electron impact ionization of copper atoms produces singly as well as twofold charged ions and causes electron avalanches. The simulation allows studying detailed energy distributions of electrons, ions and fast atoms across the gap. By scanning a large range of gas densities and electric voltages, the boundary of the breakdown region has been determined.
Keywords :
Monte Carlo methods; copper; electric breakdown; electron avalanches; electron impact ionisation; thermionic emission; vacuum interrupters; Cu; Monte Carlo simulation; charge carrier multiplication; copper ions; copper vapour; current zero; dielectric breakdown strength; electron avalanches; electron impact ionization; fast copper atoms; low pressure; thermionic emission; vacuum interrupter; Copper;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Discharges and Electrical Insulation in Vacuum (ISDEIV), 2010 24th International Symposium on
Conference_Location :
Braunschweig
ISSN :
1093-2941
Print_ISBN :
978-1-4244-8367-9
Electronic_ISBN :
1093-2941
Type :
conf
DOI :
10.1109/DEIV.2010.5625806
Filename :
5625806
Link To Document :
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