DocumentCode :
2913975
Title :
Excimer Laser Crystallisation and Processing Of Polysilicon Thin Film Transistors
Author :
Pribat, D.
fYear :
1996
fDate :
8-13 Sept. 1996
Firstpage :
334
Lastpage :
334
Keywords :
Crystallization; Germanium silicon alloys; Optical films; Optical modulation; Pulsed laser deposition; Reflectivity; Semiconductor films; Silicon alloys; Silicon germanium; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-optics Europe, 1996. CLEO/Europe., Conference on
Conference_Location :
Hamburg, Germany
Print_ISBN :
0-7803-3169-9
Type :
conf
DOI :
10.1109/CLEOE.1996.562583
Filename :
562583
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2913975
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