Title :
Thin film metallic glasses: fabrication and property test
Author :
Yongdong Liu ; Hata, S. ; Wada, K. ; Shimokohbe, A.
Author_Institution :
Precision & Intelligence Lab., Tokyo Inst. of Technol., Japan
Abstract :
Attributed to the characteristics of no size effect and good machinability, metallic glasses are considered to be ideal materials for micro-electro-mechanical systems (MEMS). In this paper, two kinds of thin film metallic glasses (TFMGs), the Zr-based (Zr/sub 75/Cu/sub 19/Al/sub 6/, atomic %) and the Pd-based (Pd/sub 76/Cu/sub 6/Si/sub 18/) TFMGs were fabricated using RF-magnetron sputtering system, and the amorphicity of the as-sputtered TFMGs were verified by X-ray diffraction and electron diffraction patterns. Compositions of the TFMGs were analyzed by energy dispersive X-ray spectrometry. Meanwhile, the thermal, mechanical and electrical properties of the TFMGs were experimentally examined, which provide an important guide for the analysis and design of their MEMS applications.
Keywords :
X-ray diffraction; aluminium alloys; copper alloys; electron diffraction; metallic glasses; metallic thin films; micromechanical devices; palladium alloys; silicon alloys; sputtered coatings; zirconium alloys; Pd/sub 76/Cu/sub 6/Si/sub 18/; RF magnetron sputtering; X-ray diffraction; Zr/sub 75/Cu/sub 19/Al/sub 6/; amorphicity; chemical composition; electrical properties; electron diffraction; energy dispersive X-ray spectrometry; fabrication; mechanical properties; micro-electro-mechanical system; thermal properties; thin film metallic glass; Fabrication; Glass; Inorganic materials; Microelectromechanical systems; Micromechanical devices; Semiconductor thin films; Testing; Transistors; X-ray diffraction; Zirconium;
Conference_Titel :
Micro Electro Mechanical Systems, 2001. MEMS 2001. The 14th IEEE International Conference on
Conference_Location :
Interlaken, Switzerland
Print_ISBN :
0-7803-5998-4
DOI :
10.1109/MEMSYS.2001.906489
