Title :
A centrally-clamped parallel-beam bistable MEMS mechanism
Author :
Qiu, J. ; Lang, J.H. ; Slocum, A.H.
Author_Institution :
MIT, Cambridge, MA, USA
Abstract :
This paper presents a monolithic mechanically-bistable mechanism that does not rely on residual stress for its bistability. The bistable mechanism comprises two centrally-clamped parallel beams that have a curved shape but no residual stress after fabrication. Modal analysis and FEA simulation of the beams are used to predict and design the bistable behavior, and they agree well. Micro-scale mechanisms are fabricated by DRIE and their test results agree well with the theoretical and numerical predictions.
Keywords :
internal stresses; micromechanical devices; modal analysis; FEA simulation; centrally-clamped parallel-beam bistable MEMS mechanism; curved shape; modal analysis; monolithic mechanically-bistable mechanism; residual stress; Analytical models; Clamps; Energy barrier; Etching; Fabrication; Micromechanical devices; Modal analysis; Predictive models; Residual stresses; Shape;
Conference_Titel :
Micro Electro Mechanical Systems, 2001. MEMS 2001. The 14th IEEE International Conference on
Conference_Location :
Interlaken, Switzerland
Print_ISBN :
0-7803-5998-4
DOI :
10.1109/MEMSYS.2001.906551
