DocumentCode :
2917215
Title :
Thick layers of silicon nitride and other materials for micromechanical structures
Author :
Moore, D.F.
Author_Institution :
Dept. of Eng., Cambridge Univ., UK
fYear :
1997
fDate :
35544
Firstpage :
42461
Lastpage :
42463
Abstract :
Silicon nitride is a very useful hard material in microsystems, especially since the technology has become available to deposit low stress thin films of Si3N4 on substrates at 500 K. This talk will concentrate on applications of Si3N4 films and outline future possibilities
Keywords :
silicon compounds; 500 K; Si3N4; hard material; micromechanical structure; microsystem; silicon nitride thin film;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Extremely Hard Materials for Micromechanics (Digest No: 1997/059), IEE Colloquium on
Conference_Location :
London
Type :
conf
DOI :
10.1049/ic:19970336
Filename :
640867
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2917215
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