DocumentCode :
2917303
Title :
Identifying degradation mechanisms in RF MEMS capacitive switches
Author :
Herfst, R.W. ; Steeneken, P.G. ; Schmitz, J.
Author_Institution :
NXP Semicond. / Corp. I&T / Res., Eindhoven
fYear :
2008
fDate :
13-17 Jan. 2008
Firstpage :
168
Lastpage :
171
Abstract :
In this paper we demonstrate how different degradation mechanisms of RF MEMS capacitive switches can be identified by carefully examining changes in key aspects of the measured C-V curves. We show that C-V curve narrowing can occur either due to mechanical deformation or to laterally inhomogeneous dielectric charging. We also show how these two degradation mechanisms can be distinguished by monitoring the change in the pull-in and pull-out voltages. Our measurements indicate that both degradation mechanisms do indeed occur in practice, depending on the stress conditions.
Keywords :
deformation; microswitches; C-V curve; RF MEMS capacitive switches; degradation mechanisms; laterally inhomogeneous dielectric charging; mechanical deformation; Capacitance-voltage characteristics; Degradation; Dielectric measurements; Electrodes; Electrostatics; Radiofrequency identification; Radiofrequency microelectromechanical systems; Springs; Switches; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2008. MEMS 2008. IEEE 21st International Conference on
Conference_Location :
Tucson, AZ
ISSN :
1084-6999
Print_ISBN :
978-1-4244-1792-6
Electronic_ISBN :
1084-6999
Type :
conf
DOI :
10.1109/MEMSYS.2008.4443619
Filename :
4443619
Link To Document :
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