DocumentCode
2917641
Title
Progress of UHF/VHF plasma antenna research
Author
Jian Sun ; Yi-Fang Xie ; Yue-Min Xu
Author_Institution
Centre for Space & Appl. Res., Beijing, China
fYear
2012
fDate
22-26 Oct. 2012
Firstpage
23
Lastpage
25
Abstract
Plasma antenna has characteristics such as low RCS, reconfigurable, etc. But compared with common metal antenna, it has larger size and weight and need extra exciting RF power. In plasma antenna research, the most serious problem is the antenna gain which is difficult to compare with common metal antennas. This article introduces the plasma antenna progress of the Chinese Academy of Science, which has begun this theme since 2004. In our research, we have got good antenna gain and pattern parameters that are very close to metal antennas.
Keywords
UHF antennas; VHF antennas; plasma devices; Chinese Academy of Science; RF power; UHF/VHF plasma antenna research; antenna gain; common metal antenna; pattern parameters; Antenna measurements; Antenna radiation patterns; Antenna theory; Metals; Plasmas; Radio frequency;
fLanguage
English
Publisher
ieee
Conference_Titel
Antennas, Propagation & EM Theory (ISAPE), 2012 10th International Symposium on
Conference_Location
Xian
Print_ISBN
978-1-4673-1799-3
Type
conf
DOI
10.1109/ISAPE.2012.6408692
Filename
6408692
Link To Document