DocumentCode :
2917641
Title :
Progress of UHF/VHF plasma antenna research
Author :
Jian Sun ; Yi-Fang Xie ; Yue-Min Xu
Author_Institution :
Centre for Space & Appl. Res., Beijing, China
fYear :
2012
fDate :
22-26 Oct. 2012
Firstpage :
23
Lastpage :
25
Abstract :
Plasma antenna has characteristics such as low RCS, reconfigurable, etc. But compared with common metal antenna, it has larger size and weight and need extra exciting RF power. In plasma antenna research, the most serious problem is the antenna gain which is difficult to compare with common metal antennas. This article introduces the plasma antenna progress of the Chinese Academy of Science, which has begun this theme since 2004. In our research, we have got good antenna gain and pattern parameters that are very close to metal antennas.
Keywords :
UHF antennas; VHF antennas; plasma devices; Chinese Academy of Science; RF power; UHF/VHF plasma antenna research; antenna gain; common metal antenna; pattern parameters; Antenna measurements; Antenna radiation patterns; Antenna theory; Metals; Plasmas; Radio frequency;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Antennas, Propagation & EM Theory (ISAPE), 2012 10th International Symposium on
Conference_Location :
Xian
Print_ISBN :
978-1-4673-1799-3
Type :
conf
DOI :
10.1109/ISAPE.2012.6408692
Filename :
6408692
Link To Document :
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