DocumentCode :
2917736
Title :
Photoluminescence and Raman properties of porous silicon at different etching times and current densities
Author :
Yusop, S.F.M. ; Abdullah, S. ; Rusop, M.
Author_Institution :
NANO-SciTech Centre, UiTM Shah Alam, Shah Alam, Malaysia
fYear :
2010
fDate :
11-14 April 2010
Firstpage :
443
Lastpage :
446
Abstract :
We study the Photoluminescence (PL) and raman properties of porous silicon as function of etching time and current density. The result shows that PL spectra give a blueshift trend and increasing intensity when etching time and current density increase. Samples that strongly emit at visible range then were analyzed using Raman measurement. As etching time increase, it shows that the Raman spectra of porous silicon slightly shift from bulk crystalline Silicon spectrum. A full half width maximum (FWHM) is gradually increasing with increasing current density.
Keywords :
Raman spectra; current density; elemental semiconductors; etching; photoluminescence; porous semiconductors; silicon; visible spectra; Raman properties; Raman spectra; Si; blueshift; current density; etching time; photoluminescence; porous silicon; visible range; Crystallization; Current density; Etching; Ethanol; Hafnium; Methanol; Nanobioscience; Photoluminescence; Raman scattering; Silicon; FWHM; PL; Photoluminescence; Porous Silicon; Raman;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Devices, Systems and Applications (ICEDSA), 2010 Intl Conf on
Conference_Location :
Kuala Lumpur
Print_ISBN :
978-1-4244-6629-0
Type :
conf
DOI :
10.1109/ICEDSA.2010.5503020
Filename :
5503020
Link To Document :
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