DocumentCode
2918116
Title
Fabrication method of sub-micrometer size planar gap for the micro fabry-perot interferometer
Author
Dohi, T. ; Hayashi, H. ; Onoe, H. ; Matsumoto, K. ; Shimoyama, I.
Author_Institution
Univ. of Tokyo, Tokyo
fYear
2008
fDate
13-17 Jan. 2008
Firstpage
335
Lastpage
338
Abstract
This paper reports on a fabrication method of sub-micrometer size tunable planar gaps for micro Fabry-Perot interferometers. We made an upper unit with a movable sub-micrometer step and a lower unit, separately. The upper unit was picked up and transferred to the lower unit by the stamping apparatus, and bonded to the lower unit by fusion bonding. Since the force during fusion bonding acts within a few nanometers only, the sub-micrometer size planar gap can be built. By using this fabrication method, we fabricated the 850 nm gap with a movable planar mirror of 500 mum in diameter. The gap was changed from 825 nm to 1020 nm by applying the voltage of 24 V.
Keywords
Fabry-Perot interferometers; adaptive optics; bonding processes; etching; micromirrors; optical design techniques; optical fabrication; optical tuning; distance 850 nm; fabrication method; fusion bonding; microFabry-Perot interferometer; movable planar mirror; size 500 mum; stamping apparatus; sub-micrometer size tunable planar gaps; voltage 24 V; Bonding forces; Etching; Fabry-Perot interferometers; Information science; Mirrors; Optical device fabrication; Optical fiber communication; Optical filters; Voltage; Water;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2008. MEMS 2008. IEEE 21st International Conference on
Conference_Location
Tucson, AZ
ISSN
1084-6999
Print_ISBN
978-1-4244-1792-6
Electronic_ISBN
1084-6999
Type
conf
DOI
10.1109/MEMSYS.2008.4443661
Filename
4443661
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