DocumentCode
2918363
Title
Atomic layer deposited alumina for micromachined resonators
Author
Chang, Y.J. ; Cobry, K. ; Bright, V.M.
Author_Institution
Univ. of Colorado, Boulder
fYear
2008
fDate
13-17 Jan. 2008
Firstpage
387
Lastpage
390
Abstract
In this work, atomic layer deposited (ALD) alumina (AI2O3) has been demonstrated as the structural material for a micro-resonator for the first time. An electrostatically actuated micro-bridge made of Cr and ALD AI2O3 was used as a resonator. The resonator was formed by simple wet- and dry-etching processes. The static displacement profile of the micro-resonator was then measured by an optical interferometer. A model of a pinned-pinned beam with axial stress of 250 MPa is used to fit the measured data. An optical method was used to measure the resonant frequency modes. The fundamental frequency of the resonator was measured around 200 kHz. Higher modes of resonance were also observed and fitted with the analytical model.
Keywords
alumina; atomic layer deposition; etching; micromachining; micromechanical resonators; alumina; etching processes; micromachined resonators; optical interferometer; pinned-pinned beam; Artificial intelligence; Atomic layer deposition; Chromium; Displacement measurement; Electrostatic measurements; Frequency measurement; Optical interferometry; Optical resonators; Resonant frequency; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2008. MEMS 2008. IEEE 21st International Conference on
Conference_Location
Tucson, AZ
ISSN
1084-6999
Print_ISBN
978-1-4244-1792-6
Electronic_ISBN
1084-6999
Type
conf
DOI
10.1109/MEMSYS.2008.4443674
Filename
4443674
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