• DocumentCode
    2918363
  • Title

    Atomic layer deposited alumina for micromachined resonators

  • Author

    Chang, Y.J. ; Cobry, K. ; Bright, V.M.

  • Author_Institution
    Univ. of Colorado, Boulder
  • fYear
    2008
  • fDate
    13-17 Jan. 2008
  • Firstpage
    387
  • Lastpage
    390
  • Abstract
    In this work, atomic layer deposited (ALD) alumina (AI2O3) has been demonstrated as the structural material for a micro-resonator for the first time. An electrostatically actuated micro-bridge made of Cr and ALD AI2O3 was used as a resonator. The resonator was formed by simple wet- and dry-etching processes. The static displacement profile of the micro-resonator was then measured by an optical interferometer. A model of a pinned-pinned beam with axial stress of 250 MPa is used to fit the measured data. An optical method was used to measure the resonant frequency modes. The fundamental frequency of the resonator was measured around 200 kHz. Higher modes of resonance were also observed and fitted with the analytical model.
  • Keywords
    alumina; atomic layer deposition; etching; micromachining; micromechanical resonators; alumina; etching processes; micromachined resonators; optical interferometer; pinned-pinned beam; Artificial intelligence; Atomic layer deposition; Chromium; Displacement measurement; Electrostatic measurements; Frequency measurement; Optical interferometry; Optical resonators; Resonant frequency; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2008. MEMS 2008. IEEE 21st International Conference on
  • Conference_Location
    Tucson, AZ
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4244-1792-6
  • Electronic_ISBN
    1084-6999
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2008.4443674
  • Filename
    4443674