Title :
CW mode-locked deep UV pulses at an average power of 800 mW
Author :
Garcia, J.C. ; Newman, A.K. ; Liu, J.M. ; Lee, M.C.
Author_Institution :
Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA
Abstract :
Summary form only given. Using an additive-pulse mode-locked (APM) Nd:LiYF/sub 4/ laser at 1053 nm with an average power of 9.3 W, a pulse width of /spl sim/5.5 ps and a repetition rate of 76 MHz, we have measured up to 800 mW of 263 nm average power. The fundamental laser output is doubled using a 5-mm-long KTiOPO/sub 4/ crystal cut in the x-y plane for type II phase matching.
Keywords :
laser mode locking; light sources; lithium compounds; neodymium; optical harmonic generation; optical phase matching; solid lasers; 1053 nm; 263 nm; 5.5 ps; 800 mW; 9.3 W; CW mode-locked deep UV pulses; KTiOPO/sub 4/; KTiOPO/sub 4/ crystal; LiYF4:Nd; OHG; SHG; YLF:Nd; additive-pulse mode-locked Nd:LiYF/sub 4/ laser; average power; fundamental laser output doubling; pulse width; repetition rate; type II phase matching; x-y plane; Diode lasers; Frequency; Optical harmonic generation; Optical pulses; Optical pumping; Optical sensors; Optimized production technology; Power lasers; Solid state circuits; Space vector pulse width modulation;
Conference_Titel :
Lasers and Electro-Optics, 2000. (CLEO 2000). Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
1-55752-634-6
DOI :
10.1109/CLEO.2000.906786
