Title :
Metallo-dielectric photonic crystals for infrared applications
Author :
Oswald, J.A. ; Wu, B.-I. ; McIntosh, K.A.
Author_Institution :
Dept. of Phys., Harvard Univ., Cambridge, MA, USA
Abstract :
Summary form only given.We have fabricated both bandstop and bandpass filters using flat scatterers for infrared wavelengths, and have used an FDTD simulation to accurately model the filter performance. The bandstop filter consists of three layers of circular metal scatterers (1.9 /spl mu/m diameter) in triangular planar arrays (3.2 /spl mu/m nearest neighbor spacing) with 2.6 /spl mu/m of planarizing polymer dielectric (n=1.45) between layers, and 1.3 /spl mu/m of dielectric on each end. The bandpass filter consists of three square-shaped inductive meshes, of period 4.2 /spl mu/m with 2.7 /spl mu/m square apertures, in the same dielectric layers. Both filters were fabricated using standard contact photolithography on a Si substrate. The level of agreement obtained for the main stopband (bandstop filter) and for the long wavelength cutoff (bandpass filter) is shown.
Keywords :
band-pass filters; band-stop filters; finite difference time-domain analysis; optical filters; photonic band gap; 3 to 5 micron; 8 to 12 micron; FDTD simulation; bandpass filters; bandstop filters; circular metal scatterers; contact photolithography; filter performance; flat scatterers; infrared filters; long wavelength cutoff; metallo-dielectric photonic crystals; planarizing polymer dielectric; square-shaped inductive meshes; triangular planar arrays; Band pass filters; Dielectric substrates; Electromagnetic scattering; Filter bank; Finite difference methods; Particle scattering; Photonic crystals; Planar arrays; Semiconductor device modeling; Time domain analysis;
Conference_Titel :
Lasers and Electro-Optics, 2000. (CLEO 2000). Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
1-55752-634-6
DOI :
10.1109/CLEO.2000.906811