Title :
High temperature high accuracy piezoresistive pressure sensor based on smart-cut soi
Author :
Shuwen Quo ; Eriksen, Harald ; Childress, Kimiko ; Fink, Anita ; Hoffman, Mary
Author_Institution :
Goodrich, Burnsville
Abstract :
Piezeoresistive pressure sensors based on SMART CUTreg SOI wafer have been developed, which can be used in extreme high temperature environments. It is demonstrated that the minority-carrier exclusion effect in ultra thin film (~0.34 mum) Smart-cut SOI enables resistance values to increase monotonically with temperature up to 600degC which is much higher than the maximum temperature of 330degC normally shown in bulk silicon resistors. Two types of packaging have been developed for different applications; one is for low pressure, high accuracy application, the other is for high pressure, high temperature application. The former is fully characterized across the range of 0.5 psi to 25 psi and -55degC to 300degC and the latter is calibrated across the range of 16 to 600 psi and -55degC to 500degC. A digitized curve fitting technique is used to calibrate the sensors by use of on-chip temperature signals. After curve fitting, the accuracy is < 0.05% F.S. for the first type of the pressure sensor and < 0.25% F.S. for the second type of the pressure sensor. A very low pressure hysteresis (< 0.1% FS) at 500degC indicates that the single crystal silicon diaphragm is capable of operating at very high temperature without creep or plastic deformation.
Keywords :
calibration; curve fitting; high-temperature techniques; piezoresistive devices; pressure measurement; pressure sensors; semiconductor device packaging; semiconductor thin films; silicon; silicon-on-insulator; thin film sensors; SMART-CUT SOI wafer; Si-JkJk; bulk silicon resistors; digitized curve fitting technique; extreme high temperature environments; minority-carrier exclusion effect; on-chip temperature signals; packaging; piezoresistive pressure sensor; pressure 16 psi to 600 psi; pressure hysteresis; resistance values; sensor calibration; single crystal silicon diaphragm; temperature -55 C to 500 C; ultra thin films; Curve fitting; Hysteresis; Intelligent sensors; Packaging; Piezoresistance; Resistors; Semiconductor thin films; Sensor phenomena and characterization; Silicon; Temperature sensors;
Conference_Titel :
Micro Electro Mechanical Systems, 2008. MEMS 2008. IEEE 21st International Conference on
Conference_Location :
Tucson, AZ
Print_ISBN :
978-1-4244-1792-6
Electronic_ISBN :
1084-6999
DOI :
10.1109/MEMSYS.2008.4443800