Title :
Gaussian etched single transverse mode vertical-cavity surface-emitting laser
Author :
Sargent, L.J. ; Plouzennec, L. ; Penty, Richard V. ; White, Ian H. ; Heard, P.J.
Author_Institution :
Dept. of Commun. Res., Bristol Univ., UK
Abstract :
Summary form only given. There is currently much interest in producing robust single transverse mode vertical-cavity surface-emitting lasers, VCSELs, for use in low cost optical data storage applications. Previous work has shown that post-processing of VCSELs using focused ion beam (FIB) etching of the device aperture to depths in the order of a quarter wavelength in the material, can substantially modify the spatial and spectral emission. The devices investigated are GaAs quantum well top-emitting lasers with proton implanted current confinement and circular cavity contact aperture diameters of 13 /spl mu/m.
Keywords :
III-V semiconductors; gallium arsenide; laser modes; optical fabrication; quantum well lasers; sputter etching; surface emitting lasers; 13 mum; GaAs; GaAs quantum well top-emitting lasers; Gaussian etched single transverse mode vertical-cavity surface-emitting laser; VCSEL; circular cavity contact aperture diameters; device aperture; focused ion beam etching; low cost optical data storage applications; proton implanted current confinement; quarter wavelength; robust single transverse mode vertical-cavity surface-emitting lasers; spatial emission; spectral emission; Apertures; Costs; Etching; Laser modes; Optical surface waves; Particle beam optics; Robustness; Stimulated emission; Surface emitting lasers; Vertical cavity surface emitting lasers;
Conference_Titel :
Lasers and Electro-Optics, 2000. (CLEO 2000). Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
1-55752-634-6
DOI :
10.1109/CLEO.2000.906866