1.3 GHz DDL on the basis of narrow reflecting groove microrelief

The results of an investigation concerning dispersive delay lines based on a SAW IDT with narrow gaps between electrodes (0.2-0.3 μm) and reflecting groove microrelief of the same width are reported. The fabrication technology is based on self consistent photolithography, which have been proposed recently for making SAW components of gigahertz frequency range. DDLs for signal expansion and compression with a center frequency of 1300 MHz, a frequency deviation of 150 MHz and impulse response duration of 2 μs were fabricated. Position weighting was applied to obtain a desired frequency response of down-chirp and up-chirp RACs. The investigations of DDL characteristics depending on submicron groove depth were carried out, and a method to compensate for technological deviations by means of variation in RAC configuration was used