Abstract :
Presents the table of contents of the proceedings.
Keywords :
Automatic testing; High K dielectric materials; High-K gate dielectrics; MOSFETs; Negative bias temperature instability; Niobium compounds; Plasma temperature; Stress; System testing; Titanium compounds;
Conference_Titel :
Integrated Reliability Workshop Final Report, 2008. IRW 2008. IEEE International
Conference_Location :
S. Lake Tahoe, CA
Print_ISBN :
978-1-4244-2194-7
DOI :
10.1109/IRWS.2008.4796069
