DocumentCode
2921971
Title
Contents
fYear
2008
fDate
12-16 Oct. 2008
Abstract
Presents the table of contents of the proceedings.
Keywords
Automatic testing; High K dielectric materials; High-K gate dielectrics; MOSFETs; Negative bias temperature instability; Niobium compounds; Plasma temperature; Stress; System testing; Titanium compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report, 2008. IRW 2008. IEEE International
Conference_Location
S. Lake Tahoe, CA
ISSN
1930-8841
Print_ISBN
978-1-4244-2194-7
Type
conf
DOI
10.1109/IRWS.2008.4796069
Filename
4796069
Link To Document