Abstract :
Presents the introductory welcome message from the conference proceedings.
Keywords :
Atmosphere; Circuits; High K dielectric materials; Maintenance; Meetings; Niobium compounds; Quality assurance; Robustness; Semiconductor device reliability; Titanium compounds;
Conference_Titel :
Integrated Reliability Workshop Final Report, 2008. IRW 2008. IEEE International
Conference_Location :
S. Lake Tahoe, CA
Print_ISBN :
978-1-4244-2194-7
DOI :
10.1109/IRWS.2008.4796070
