• DocumentCode
    2922105
  • Title

    Reliability of Electrostatically Actuated RF MEMS Switches

  • Author

    Hwang, James C M

  • Author_Institution
    Lehigh Univ., Bethlehem
  • fYear
    2007
  • fDate
    9-11 Dec. 2007
  • Firstpage
    168
  • Lastpage
    171
  • Abstract
    The reliability of electrostatically actuated RF MEMS switches is reviewed with emphasis on recent advancements. Both ohmic and capacitive switches have been operated for more 100-billion cycles without failure. When they do fail, ohmic switches tend to fail catastrophically by stiction, whereas capacitive switches often degrade gradually through charging of their dielectric insulators. Approaches to mitigate and model dielectric charging are then presented.
  • Keywords
    electrostatic devices; microswitches; ohmic contacts; reliability; RF MEMS switch reliability; charge injection; dielectric charging mitigation; dielectric films; electrostatically actuated MEMS switch; microelectromechanical devices; ohmic contacts; Chemicals; Conductivity; Contact resistance; Dielectrics; Microelectromechanical devices; Micromechanical devices; Radiofrequency microelectromechanical systems; Stress; Surface resistance; Switches; Charge injection; contacts; dielectric films; dielectric materials; microelectromechanical devices; ohmic contacts; switches;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Radio-Frequency Integration Technology, 2007. RFIT 007. IEEE International Workshop on
  • Conference_Location
    Rasa Sentosa Resort
  • Print_ISBN
    978-1-4244-1307-2
  • Electronic_ISBN
    978-1-4244-1308-9
  • Type

    conf

  • DOI
    10.1109/RFIT.2007.4443942
  • Filename
    4443942