• DocumentCode
    2922121
  • Title

    Impact of Oxygen Vacancies Profile and Fringe Effect on Leakage Current Instability of Tantalum Pentoxide Metal-Insulator-Metal (MIM) Capacitors

  • Author

    Martinez, Vincent ; Besset, Carine ; Monsieur, Frédéric ; Montès, Laurent ; Ghibaudo, Gérard

  • Author_Institution
    ST Microelectron., Crolles
  • fYear
    2008
  • fDate
    12-16 Oct. 2008
  • Firstpage
    21
  • Lastpage
    24
  • Abstract
    In recent papers conduction mechanism in tantalum pentoxide MIM capacitors was found to follow the space charge limited theory and the asymmetry between positive and negative polarization was attributed to an inhomogeneous spatial distribution of traps. Furthermore, the role of the top electrode geometry on the conduction was highlighted using a large range of test structures, allowing the complete characterization of the leakage current at time zero. However, other studies showed the instability of the leakage current in Ta2O5 during electrical stresses. In this study, a proof is given of the strong influence of the oxygen vacancies profile on the current instability as well as on the leakage current asymmetry between positive and negative polarization. Moreover, dedicated test structures are used to extract surface and peripheral component of the current during electrical stress, leading to a self consistent relation between the I-V and I-t characteristics.
  • Keywords
    MIM devices; capacitors; leakage currents; tantalum compounds; vacancies (crystal); Ta2O5; electrical stress; fringe effect; leakage current instability; metal-insulator-metal capacitors; negative polarization; oxygen vacancies; positive polarization; Electrodes; Geometry; Leakage current; MIM capacitors; Metal-insulator structures; Optical polarization; Oxygen; Space charge; Stress; Testing; MIM capacitor; SCLC; leakage current instability; oxygen vacancies; tantalum pentoxide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report, 2008. IRW 2008. IEEE International
  • Conference_Location
    S. Lake Tahoe, CA
  • ISSN
    1930-8841
  • Print_ISBN
    978-1-4244-2194-7
  • Electronic_ISBN
    1930-8841
  • Type

    conf

  • DOI
    10.1109/IRWS.2008.4796078
  • Filename
    4796078