DocumentCode
2922270
Title
Moving Carefully Towards Model-based Layout Optimization and Checking
Author
Hibbeler, Jason D. ; Maynard, Daniel N.
Author_Institution
IBM, Essex Junction
fYear
2007
fDate
11-12 June 2007
Firstpage
24
Lastpage
28
Abstract
IBM has taken several steps in developing an analysis and optimization framework for VLSI layouts. We have deployed automated tools to reduce the sensitivity of designs to certain defect mechanisms in the manufacturing process. We see a clear need for expanding and refining tMs work and then integrating it with rigorous characterization of manufacturing processes and at the same time developing and integrating an overall trade-off theory showing the interaction of different layout-based yield-enhancement actions.
Keywords
VLSI; integrated circuit layout; integrated circuit modelling; integrated circuit yield; optimisation; IBM; VLSI layouts; automated tools; defect mechanisms; layout-based yield-enhancement; manufacturing process; model-based layout optimization; trade-off theory; Design optimization; Libraries; Manufacturing industries; Manufacturing processes; Microprocessors; Production; Semiconductor device manufacture; Space technology; Very large scale integration; Virtual manufacturing;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference, 2007. ASMC 2007. IEEE/SEMI
Conference_Location
Stresa
Print_ISBN
1-4244-0652-8
Electronic_ISBN
1-4244-0653-6
Type
conf
DOI
10.1109/ASMC.2007.375074
Filename
4259240
Link To Document