DocumentCode :
2922397
Title :
Coupled Approach for Reliability Study of Fully Self Aligned SiGe: C 250GHz HBTs
Author :
Diop, Malick ; Revil, N. ; Marin, Mathieu ; Monsieur, Frédéric ; Schwartzmann, Thierry ; Ghibaudo, Gérard
Author_Institution :
STMicroelectronics, Crolles
fYear :
2008
fDate :
12-16 Oct. 2008
Firstpage :
77
Lastpage :
80
Abstract :
High performance bipolar transistors were investigated under both reverse and forward stress conditions. Although classical hot-carrier induced degradation has been shown in reverse mode, the results obtained under forward conditions were not in line with those reported for previous device generation. Indeed, the coupled approach using low frequency noise spectra measurements and reliability studies show a relaxation of the pre-existing and/or created defects during stress. Moreover, coexistence of both classical Shockley-Read-Hall recombination and unusual trap-assisted tunnelling is clearly demonstrated and confirmed by TCAD simulations.
Keywords :
Ge-Si alloys; heterojunction bipolar transistors; millimetre wave couplers; millimetre wave transistors; semiconductor device measurement; semiconductor device noise; semiconductor device reliability; HBT; SiGe:C; device generation; device stress defects; frequency 250 GHz; high performance bipolar transistors; low frequency noise spectra measurements; reliability studies; Bipolar transistors; Degradation; Frequency measurement; Germanium silicon alloys; Hot carriers; Low-frequency noise; Noise measurement; Silicon germanium; Stress measurement; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report, 2008. IRW 2008. IEEE International
Conference_Location :
S. Lake Tahoe, CA
ISSN :
1930-8841
Print_ISBN :
978-1-4244-2194-7
Electronic_ISBN :
1930-8841
Type :
conf
DOI :
10.1109/IRWS.2008.4796091
Filename :
4796091
Link To Document :
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