Title :
Light emission from a single InGaN quantum dot formed by selective area growth
Author :
Tachibana, K. ; Someya, T. ; Ishida, S. ; Arakawa, Y.
Author_Institution :
Res. Center for Adv. Sci. & Tech., Tokyo Univ., Japan
Abstract :
Summary form only given.InGaN quantum dot (QD) structure has attracted much attention because the lasers with InGaN QDs embedded in the active layer have lower threshold currents and narrower emission spectra than conventional lasers. To fabricate InGaN QD structure, there are two methods: self-assembled technique and selective area growth (SAG) technique. A few reports have been conducted on the SAG of InGaN. In this paper we report on fabrication of InGaN QDs using SAG on a SiO/sub 2/ patterned substrate. A micro-photoluminescence (micro-FL) image with spatial resolution of 150 nm successfully demonstrated light emission from individual QDs on the top of GaN pyramids.
Keywords :
III-V semiconductors; MOCVD; gallium compounds; indium compounds; optical fabrication; optical images; photoluminescence; semiconductor quantum dots; GaN pyramids; InGaN; InGaN QD fabrication; InGaN QD structure; SiO/sub 2/; SiO/sub 2/ patterned substrate; light emission; lower threshold currents; micro-photoluminescence image; narrower emission spectra; selective area growth; self-assembled technique; single InGaN quantum dot; spatial resolution; Cameras; Doping; Filters; Gallium nitride; III-V semiconductor materials; Oxidation; Quantum dots; Silicon; Spatial resolution; US Department of Transportation;
Conference_Titel :
Lasers and Electro-Optics, 2000. (CLEO 2000). Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
1-55752-634-6
DOI :
10.1109/CLEO.2000.906971