• DocumentCode
    2923084
  • Title

    Effect of substrate hot carrier stress on high-k gate stack

  • Author

    Park, H. ; Bersuker, G. ; Kang, C.Y. ; Young, C. ; Tseng, H-H ; Jammy, R.

  • Author_Institution
    SEMATECH, Austin, Tx, 78741, U. S. A.
  • fYear
    2008
  • fDate
    12-16 Oct. 2008
  • Firstpage
    1
  • Lastpage
    16
  • Keywords
    Annealing; Fluid flow measurement; Frequency measurement; Hafnium oxide; High K dielectric materials; High-K gate dielectrics; Hot carriers; MOSFET circuits; Stress measurement; Substrate hot electron injection;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report, 2008. IRW 2008. IEEE International
  • Conference_Location
    South lake Tahoe, CA, USA
  • ISSN
    1930-8841
  • Print_ISBN
    978-1-4244-2194-7
  • Electronic_ISBN
    1930-8841
  • Type

    conf

  • DOI
    10.1109/IRWS.2008.4796129
  • Filename
    4796129
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2923084