• DocumentCode
    2923282
  • Title

    Negative Bias Temperature Stress on PFETs within fast Wafer Level Reliability Monitoring

  • Author

    Vollertsen, R.-P. ; Reisinger, H. ; Schlünder, C.

  • Author_Institution
    Infineon Technologies AG, Otto-Hahn-Ring 6, 81739 Munchen, Germany
  • fYear
    2008
  • fDate
    12-16 Oct. 2008
  • Firstpage
    1
  • Lastpage
    17
  • Keywords
    Monitoring; Stress; Temperature; Zirconium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report, 2008. IRW 2008. IEEE International
  • Conference_Location
    South lake Tahoe, CA, USA
  • ISSN
    1930-8841
  • Print_ISBN
    978-1-4244-2194-7
  • Electronic_ISBN
    1930-8841
  • Type

    conf

  • DOI
    10.1109/IRWS.2008.4796139
  • Filename
    4796139