DocumentCode
2923282
Title
Negative Bias Temperature Stress on PFETs within fast Wafer Level Reliability Monitoring
Author
Vollertsen, R.-P. ; Reisinger, H. ; Schlünder, C.
Author_Institution
Infineon Technologies AG, Otto-Hahn-Ring 6, 81739 Munchen, Germany
fYear
2008
fDate
12-16 Oct. 2008
Firstpage
1
Lastpage
17
Keywords
Monitoring; Stress; Temperature; Zirconium;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report, 2008. IRW 2008. IEEE International
Conference_Location
South lake Tahoe, CA, USA
ISSN
1930-8841
Print_ISBN
978-1-4244-2194-7
Electronic_ISBN
1930-8841
Type
conf
DOI
10.1109/IRWS.2008.4796139
Filename
4796139
Link To Document