Title :
Negative Bias Temperature Stress on PFETs within fast Wafer Level Reliability Monitoring
Author :
Vollertsen, R.-P. ; Reisinger, H. ; Schlünder, C.
Author_Institution :
Infineon Technologies AG, Otto-Hahn-Ring 6, 81739 Munchen, Germany
Keywords :
Monitoring; Stress; Temperature; Zirconium;
Conference_Titel :
Integrated Reliability Workshop Final Report, 2008. IRW 2008. IEEE International
Conference_Location :
South lake Tahoe, CA, USA
Print_ISBN :
978-1-4244-2194-7
Electronic_ISBN :
1930-8841
DOI :
10.1109/IRWS.2008.4796139
