DocumentCode
2923355
Title
Reliability Guard Band Reduction by Differential Targeting of pMOS Gate Oxide Thickness
Author
Geilenkeuser, R. ; Wieczorek, K. ; Trentzsch, M. ; Graetsch, F. ; Bayha, B. ; Samohvalov, V. ; Paetzold, T. ; Schink, T.
Author_Institution
AMD Fab 36 LLC & Co. KG, Dresden, Germany
fYear
2008
fDate
12-16 Oct. 2008
Abstract
This article consists of a collection of slides from the author´s conference presentation. Some of the specific areas/topics discussed include: Introduction; Experimental; Device degradation sensitivity studies; Differential GOX thickness tuning; Product Wearout; and a Summary.
Keywords
Degradation; Extrapolation; Frequency; Niobium compounds; Titanium compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report, 2008. IRW 2008. IEEE International
Conference_Location
S. Lake Tahoe, CA
ISSN
1930-8841
Print_ISBN
978-1-4244-2194-7
Type
conf
DOI
10.1109/IRWS.2008.4796142
Filename
4796142
Link To Document