• DocumentCode
    2923799
  • Title

    Optimum femtosecond K-shell x-ray fine emission from femtosecond laser-produced plasma

  • Author

    Nakano, Hidetoshi ; Nishikawa, Tadashi ; Andreev, Alexander A.

  • Author_Institution
    NTT Basic Res. Labs., NTT Corp., Kanagawa, Japan
  • Volume
    2
  • fYear
    2002
  • fDate
    10-14 Nov. 2002
  • Firstpage
    708
  • Abstract
    In summary, we experimentally determined the optimum conditions for ultrashort Kα line emission from femtosecond laser-produced plasma. The simple analytical scaling model of Kα emission using plasma and fast electron parameters agreed satisfactorily with our experimental results. The maximum conversion efficiency for a 4-μm thick aluminum film target was given.
  • Keywords
    metallic thin films; plasma X-ray sources; plasma production by laser; 4 micron; Al; aluminum film target; fast electron parameters; femtosecond laser-produced plasma; maximum conversion efficiency; optimum femtosecond K-shell x-ray fine emission; ultrashort Kα line emission; Absorption; Aluminum; Electrons; Laser modes; Optical pulses; Plasma x-ray sources; Pulse measurements; Resonance; Surface emitting lasers; X-ray lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Society, 2002. LEOS 2002. The 15th Annual Meeting of the IEEE
  • ISSN
    1092-8081
  • Print_ISBN
    0-7803-7500-9
  • Type

    conf

  • DOI
    10.1109/LEOS.2002.1159503
  • Filename
    1159503
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2923799