DocumentCode :
2923799
Title :
Optimum femtosecond K-shell x-ray fine emission from femtosecond laser-produced plasma
Author :
Nakano, Hidetoshi ; Nishikawa, Tadashi ; Andreev, Alexander A.
Author_Institution :
NTT Basic Res. Labs., NTT Corp., Kanagawa, Japan
Volume :
2
fYear :
2002
fDate :
10-14 Nov. 2002
Firstpage :
708
Abstract :
In summary, we experimentally determined the optimum conditions for ultrashort Kα line emission from femtosecond laser-produced plasma. The simple analytical scaling model of Kα emission using plasma and fast electron parameters agreed satisfactorily with our experimental results. The maximum conversion efficiency for a 4-μm thick aluminum film target was given.
Keywords :
metallic thin films; plasma X-ray sources; plasma production by laser; 4 micron; Al; aluminum film target; fast electron parameters; femtosecond laser-produced plasma; maximum conversion efficiency; optimum femtosecond K-shell x-ray fine emission; ultrashort Kα line emission; Absorption; Aluminum; Electrons; Laser modes; Optical pulses; Plasma x-ray sources; Pulse measurements; Resonance; Surface emitting lasers; X-ray lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society, 2002. LEOS 2002. The 15th Annual Meeting of the IEEE
ISSN :
1092-8081
Print_ISBN :
0-7803-7500-9
Type :
conf
DOI :
10.1109/LEOS.2002.1159503
Filename :
1159503
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2923799
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