DocumentCode :
2924177
Title :
Numerical analysis of silicon-on-insulator thin-film solar cells
Author :
Iwata, Hideyuki ; Ohzone, Takashi ; Takakura, Hideyuki
Author_Institution :
Dept. of Electron. & Inf., Toyama Prefectural Univ., Japan
Volume :
2
fYear :
1994
fDate :
5-9 Dec 1994
Firstpage :
1437
Abstract :
The property of thin-film single-crystalline silicon solar cells fabricated on the SOI substrate has been investigated through two-dimensional numerical device simulation. The SOI film/buried SiO2 interface condition is changed by back-gate biases. When the bottom region of the SOI film is accumulated by applying large back-gate bias, conversion efficiency is improved compared to the zero back-gate bias case. However, sufficiently high conversion efficiency cannot be obtained by using the conventional structure. Two proposals to increase the conversion efficiency of SOI thin-film solar cell are presented. A conversion efficiency of about 24 percent can be realized for the improved cell if the complete optical confinement is assumed
Keywords :
elemental semiconductors; numerical analysis; semiconductor device models; semiconductor thin films; silicon; silicon-on-insulator; solar cells; substrates; 24 percent; 2D numerical device simulation; SOI substrate; Si; SiO2; back-gate biases; conversion efficiency; optical confinement; semiconductor; silicon-on-insulator; thin-film solar cells; Numerical analysis; Numerical simulation; Optical films; Photovoltaic cells; Proposals; Semiconductor thin films; Silicon on insulator technology; Substrates; Thin film devices; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Energy Conversion, 1994., Conference Record of the Twenty Fourth. IEEE Photovoltaic Specialists Conference - 1994, 1994 IEEE First World Conference on
Conference_Location :
Waikoloa, HI
Print_ISBN :
0-7803-1460-3
Type :
conf
DOI :
10.1109/WCPEC.1994.520219
Filename :
520219
Link To Document :
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