Title :
100 A/cm2 high emission current density oxide cathode
Author :
Wang, Xiaoxia ; Zhang, Min ; Liao, Xianheng ; Luo, JirRun ; Zhao, Qinglan ; Li, Yun ; Zhang, Qi
Author_Institution :
Key Lab. of High Power Microwave Sources & Technol., Inst. of Electron., Beijing, China
Abstract :
In this paper we mainly describes the research progress in a kind of plasma spraying coating oxide cathode, which includes the preparation of Ni-Sc sponge layer and plasma spraying Sc doped coating and the properties testing. The testing results show that the dc emission current density of the cathode is over 4A/cm2 and the pulse emission current density reaches 103 A/cm2 with a 1μs pulse width at a temperature of 850°C br.
Keywords :
current density; nickel; oxide coated cathodes; plasma arc sprayed coatings; scandium; DC emission current density; Ni-Sc; high emission current density oxide cathode; plasma spraying coating oxide cathode; properties testing; pulse emission current density; sponge layer preparation; temperature 850 degC; time 1 mus; Cathodes; Coatings; Current density; Plasma temperature; Resistance; Spraying; High Emission Current; Oxide Cathode; Plasma Spraying;
Conference_Titel :
Vacuum Electron Sources Conference (IVESC), 2012 IEEE Ninth International
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4673-0368-2
DOI :
10.1109/IVESC.2012.6264160
