• DocumentCode
    2925195
  • Title

    The policy impact on clean technology diffusion

  • Author

    Chen, Yi-Tui ; Chang, Dong-Shang ; Chen, Chia-Yon

  • Author_Institution
    Dept. of Health Care Manage., Nat. Taipei Univ. of Nursing & Health Sci., Taipei, Taiwan
  • fYear
    2011
  • fDate
    27-30 June 2011
  • Firstpage
    558
  • Lastpage
    568
  • Abstract
    We employ a logistic model to examine the impacts of environmental policy (emission standards and economic instruments) and plant characteristics on clean technology diffusion by using the amount of Total Suspended Particulate (TSP), Sulfer Oxide (SOx), and Nitric Oxide (NOx) emissions in 14 power plants provided by Taiwan Power Company covering the period of 1989-2006. The concentration of the pollutants emitted to air from fossil-fired power plants is modeled as the performance of technology development. The objective of this study is to investigate the determinants of technology diffusion to help generate strategic insights on environmental policy. The results show that the environmental policy by regulating emission standard provides a negative effect on technology diffusion while the `mixed policy´ (an integration of environmental standards and economic instruments) has a significantly positive effect on technology diffusion for NOx but insignificantly for TSP and SOx.
  • Keywords
    air pollution control; fossil fuels; logistics; nitrogen compounds; standards; sulphur compounds; suspensions; thermal power stations; Taiwan power company; clean technology diffusion; economic instruments; emission standard; emission standards; environmental policy; fossil-fired power plants; logistic model; nitric oxide; power plants; suffer oxide; total suspended particulate; Air pollution; Cities and towns; Logistics; Power generation; Standards; Technological innovation; emission standard; logistic model; technology diffusion;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Technology Management Conference (ITMC), 2011 IEEE International
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-61284-951-5
  • Type

    conf

  • DOI
    10.1109/ITMC.2011.5996027
  • Filename
    5996027