Title :
An exploratory study on change resistance measurement
Author :
Chang, Joshua C.
Author_Institution :
Dept. of Inf. Manage., Chien-Kuo Technol. Univ., Changhua, Taiwan
Abstract :
Resistance to affirmative organization change is inevitable since organization members are asked to reexamine and modify their behaviors that cultivates resistance. Resistance serves to maintain equilibrium until the reasons for change are both conscious and compelling. Instead of accepting people´s feelings as excuses, persistently push for what you know needs to happen in the face of today´s harsh realities (Agocs, 1997; Pamela, 1997). It´s important to reevaluation the appropriate status of “Change Resistance Scale (CRS)” for current changing environment since the Information Technology revolutions are wildly happened internally in organizations. The results reveal the consistency of this scale and display the items of the CRS instrument with high-level reliability. The outcome of the structure model, which in the overall satisfaction is broken out into five dimensions, confirms that the structural model is a good fit. Research suggests in lieu of accepting people´s feelings as excuses, persistently push for what you know needs to happen in the face of today´s cruel realities. Furnish lucency vision, allow participate in planning, offer persistent supports, and the stability of multi-communication channels.
Keywords :
business communication; information technology; management of change; organisational aspects; planning; psychology; behaviors; change resistance scale; information technology; multicommunication channels; organization change resistance measurement; planning; reliability; Correlation; Eigenvalues and eigenfunctions; Immune system; Information technology; Mathematical model; Organizations; Resistance; Change Resistance Scale; Information Technology revolutions; Resistance to change;
Conference_Titel :
Technology Management Conference (ITMC), 2011 IEEE International
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-61284-951-5
DOI :
10.1109/ITMC.2011.5996069