Title :
Polarization Shifting Technique in Interferometric Ellipsometer for Two-Dimensional Characterization of Silicon Wafer
Author :
Chou, Chien ; Teng, Hui-Kang
Author_Institution :
Inst. Radiol. Sci., Natonal Yang-Ming University, Taiwan
Abstract :
A polarization state shifting method is applied for determining the thickness of SiO2 thin film on Si substrate. The ellipsometric parameters are obtained by the image frames under different polarization modification of reflected beam.
Keywords :
Biomedical measurements; Charge coupled devices; Interference; Optical interferometry; Optical polarization; Optical retarders; Semiconductor thin films; Silicon; Substrates; Transistors;
Conference_Titel :
Lasers and Electro-Optics, 2005. CLEO/Pacific Rim 2005. Pacific Rim Conference on
Print_ISBN :
0-7803-9242-6
DOI :
10.1109/CLEOPR.2005.1569764
