DocumentCode
2927208
Title
9.5: Microfabrication of a 220 GHz grating for sheet beam amplifiers
Author
Joye, Colin D. ; Calame, Jeffrey P. ; Garven, Morag ; Park, Doewon ; Bass, Robert ; Levush, Baruch
Author_Institution
Naval Res. Lab., Washington, DC, USA
fYear
2010
fDate
18-20 May 2010
Firstpage
187
Lastpage
188
Abstract
A 50 watt CW 220 GHz sheet beam amplifier is under development at NRL. We report on microfabrication techniques used to construct a grating-based amplifier circuit using Ultraviolet Lithography (UV-LIGA) and Deep Reactive Ion etching (DRIE).
Keywords
electron beams; microfabrication; sputter etching; ultraviolet lithography; deep reactive ion etching; frequency 200 GHz; grating-based amplifier circuit; microfabrication; sheet beam amplifiers; ultraviolet lithography; Bandwidth; Circuits; Copper; Dispersion; Electron beams; Etching; Geometry; Gratings; Thermal conductivity; Voltage; SU-8; Sheet beam; UV-LIGA; millimeter wave; slow-wave amplifier;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics Conference (IVEC), 2010 IEEE International
Conference_Location
Monterey, CA
Print_ISBN
978-1-4244-7098-3
Type
conf
DOI
10.1109/IVELEC.2010.5503539
Filename
5503539
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