DocumentCode :
2927319
Title :
9.2: Fabrication techniques for a THz EIK
Author :
Dobbs, Richard ; Roitman, Albert ; Horoyski, Peter ; Hyttinen, Mark ; Sweeney, Dan ; Chernin, David ; Blank, Monica ; Barker, N. Scott ; Booske, John ; Wright, Edward ; Calame, Jeffrey ; Makarova, Olga V.
Author_Institution :
Commun. & Power Ind. Canada, Georgetown, ON, Canada
fYear :
2010
fDate :
18-20 May 2010
Firstpage :
181
Lastpage :
182
Abstract :
To produce an EIK working at THz frequencies, departure from traditional fabrication techniques is required. This paper describes the investigation and results of various fabrication techniques and their suitability for application in a VED.
Keywords :
klystrons; ultraviolet lithography; EIK; fabrication techniques; terahertz frequency; Bonding; Circuits; Electrodes; Fabrication; Frequency; Laboratories; Power industry; Resists; Wire; X-ray lithography; EDM; EIK; Micromachining; THz; UV Lithography; X-Ray Lithography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Electronics Conference (IVEC), 2010 IEEE International
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4244-7098-3
Type :
conf
DOI :
10.1109/IVELEC.2010.5503544
Filename :
5503544
Link To Document :
بازگشت