DocumentCode :
2927440
Title :
Characterization of Boron Nitride Thin Films Prepared by Femtosecond Pulsed Laser Deposition
Author :
Shimizu, T. ; Yoneyama, T. ; Sato, S.
Author_Institution :
Insitute of Multidisciplinary Research for Advanced Materials, Tohoku University, Japan; tasu-432@mail.tagen.tohoku.ac.jp
fYear :
2005
fDate :
30-02 Aug. 2005
Firstpage :
1538
Lastpage :
1539
Abstract :
We performed characterization of boron nitride thin films made by femtosecond pulsed laser deposition. FT-IR and electron diffraction analysis indicated the content of wurtzite boron nitride phase, for the first time to our best knowledge.
Keywords :
Boron; Diffraction; Electrons; Laser mode locking; Optical pulses; Pulsed laser deposition; Pump lasers; Sputtering; Temperature; Ultrafast electronics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2005. CLEO/Pacific Rim 2005. Pacific Rim Conference on
Print_ISBN :
0-7803-9242-6
Type :
conf
DOI :
10.1109/CLEOPR.2005.1569808
Filename :
1569808
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2927440
بازگشت