DocumentCode
2927440
Title
Characterization of Boron Nitride Thin Films Prepared by Femtosecond Pulsed Laser Deposition
Author
Shimizu, T. ; Yoneyama, T. ; Sato, S.
Author_Institution
Insitute of Multidisciplinary Research for Advanced Materials, Tohoku University, Japan; tasu-432@mail.tagen.tohoku.ac.jp
fYear
2005
fDate
30-02 Aug. 2005
Firstpage
1538
Lastpage
1539
Abstract
We performed characterization of boron nitride thin films made by femtosecond pulsed laser deposition. FT-IR and electron diffraction analysis indicated the content of wurtzite boron nitride phase, for the first time to our best knowledge.
Keywords
Boron; Diffraction; Electrons; Laser mode locking; Optical pulses; Pulsed laser deposition; Pump lasers; Sputtering; Temperature; Ultrafast electronics;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2005. CLEO/Pacific Rim 2005. Pacific Rim Conference on
Print_ISBN
0-7803-9242-6
Type
conf
DOI
10.1109/CLEOPR.2005.1569808
Filename
1569808
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