Title :
Characterization of excimer lasers for application to lenslet array
Author :
Ying Lin ; Buck, J.
Author_Institution :
Cymer Inc., San Diego, CA, USA
Abstract :
Summary form only given. Lenslet homogenizers are often used to improve the uniformity of illumination in condenser systems for photolithography. A typical photolithographic optical system is illustrated schematically. A lenslet array, simplified to a 3/spl times/3 element array for the drawing, forms an array of point sources. The condenser lens reimages the array of point sources into the pupil of the relay lens. The relay lens images the plane of the mask (target plane) onto the photographic medium.
Keywords :
excimer lasers; laser beam applications; laser beams; lenses; optical arrays; photolithography; 3/spl times/3 element array; condenser lens reimaging; condenser systems; excimer lasers; illumination uniformity; lenslet array; lenslet homogenizers; mask; photolithographic optical system; photolithography; point sources; Ionization; Large Hadron Collider; Laser applications; Lithography; Multichip modules; Optical arrays; Petroleum; Phased arrays; Relays;
Conference_Titel :
Lasers and Electro-Optics, 2000. (CLEO 2000). Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
1-55752-634-6
DOI :
10.1109/CLEO.2000.907308