• DocumentCode
    2928562
  • Title

    Characterization of excimer lasers for application to lenslet array

  • Author

    Ying Lin ; Buck, J.

  • Author_Institution
    Cymer Inc., San Diego, CA, USA
  • fYear
    2000
  • fDate
    7-12 May 2000
  • Firstpage
    500
  • Lastpage
    501
  • Abstract
    Summary form only given. Lenslet homogenizers are often used to improve the uniformity of illumination in condenser systems for photolithography. A typical photolithographic optical system is illustrated schematically. A lenslet array, simplified to a 3/spl times/3 element array for the drawing, forms an array of point sources. The condenser lens reimages the array of point sources into the pupil of the relay lens. The relay lens images the plane of the mask (target plane) onto the photographic medium.
  • Keywords
    excimer lasers; laser beam applications; laser beams; lenses; optical arrays; photolithography; 3/spl times/3 element array; condenser lens reimaging; condenser systems; excimer lasers; illumination uniformity; lenslet array; lenslet homogenizers; mask; photolithographic optical system; photolithography; point sources; Ionization; Large Hadron Collider; Laser applications; Lithography; Multichip modules; Optical arrays; Petroleum; Phased arrays; Relays;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2000. (CLEO 2000). Conference on
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    1-55752-634-6
  • Type

    conf

  • DOI
    10.1109/CLEO.2000.907308
  • Filename
    907308