Title :
High speed Flash Memory and 1T-DRAM on dopant segregated Schottky barrier (DSSB) FinFET SONOS device for multi-functional SoC applications
Author :
Choi, Yang-Kyu ; Han, Jin-Woo ; Kim, Sungho ; Kim, Dong-Hyun ; Jang, Moon-Gyu ; Yang, Jong-Heon ; Kim, Jin Soo ; Kim, Kwang Hee ; Lee, Gi Sung ; Oh, Jae Sub ; Song, Myeong Ho ; Park, Yun Chang ; Kim, Jeoung Woo ; Yang-Kyu Choi
Author_Institution :
EECS, KAIST, Daejeon
Abstract :
A novel dopant segregated Schottky barrier (DSSB) FinFET SONOS device is demonstrated in terms of multi functioning in a high speed NAND-type flash memory and capacitorless 1T-DRAM. In addition, a novel program mechanism that uses energy band engineered hot electrons (EBEHE) energized by sharp energy band bending at the edge of source/drain (S/D) is proposed for a high speed flash memory programming operation. A short program time of 100 ns and a low program voltage of 12 V yield a Vth shift of 3.5 V and a retention time exceeding 10 years. For multi functioning, the operation of a capacitorless 1T-DRAM is also demonstrated with a partially silicided DSSB in the same device.
Keywords :
DRAM chips; MOSFET; MOSFET circuits; NAND circuits; Schottky barriers; band structure; flash memories; system-on-chip; 1T-DRAM; dopant segregated Schottky barrier FinFET SONOS device; energy band engineered hot electrons; high speed NAND-type flash memory; high speed flash memory programming; multifunctional SoC applications; sharp energy band bending; time 100 ns; voltage 12 V; voltage 3.5 V; Decision support systems; Fabrication; FinFETs; Flash memory; Nanoscale devices; Nickel; Nonvolatile memory; SONOS devices; Schottky barriers; Silicidation;
Conference_Titel :
Electron Devices Meeting, 2008. IEDM 2008. IEEE International
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4244-2377-4
Electronic_ISBN :
8164-2284
DOI :
10.1109/IEDM.2008.4796657