• DocumentCode
    2930121
  • Title

    A new instrument for measuring low level linear birefringence

  • Author

    Oakberg, T.C. ; Wang, B.

  • Author_Institution
    Hinds Instrum. Inc., Hillsboro, OR, USA
  • fYear
    2000
  • fDate
    7-12 May 2000
  • Firstpage
    569
  • Abstract
    Summary form only given. Modern optical instruments, such as semiconductor photolithography equipment, require increasingly low levels of birefringence in lenses, masks and laser windows. Traditional techniques lack the sensitivity required, are cumbersome and time consuming and are not readily adapted for scanning a sample. Hinds Instruments has developed a highly sensitive instrument (Exicor/sup TM/) for rapid automatic scanning of samples of optical materials in two dimensions. This yields both the magnitude and direction of the "average birefringence" for each measurement point. The method employs a HeNe laser, a photoelastic modulator (PEM), calcite polarizers and photoconductive detectors in a unique 2-channel detection system. The two channels measure birefringence at two orthogonal directions 45 degrees apart, giving complete information for determination of the magnitude and direction of birefringence at each measurement point.
  • Keywords
    birefringence; gas lasers; optical instruments; optical materials; optical polarisers; optical scanners; optical variables measurement; photoconducting devices; photodetectors; photoelasticity; sensitivity; 2-channel detection system; Exicor/sup TM/; HeNe; HeNe laser; Hinds Instruments; average birefringence; birefringence; birefringence direction; birefringence magnitude; calcite polarizers; highly sensitive instrument; instrument; laser windows; lenses; low level linear birefringence; masks; measurement point; modern optical instruments; optical material; orthogonal directions; photoconductive detectors; photoelastic modulator; rapid automatic scanning; sample; samples; scanning; semiconductor photolithography equipment; sensitivity; Birefringence; Instruments; Laser modes; Lenses; Lithography; Optical materials; Optical polarization; Optical sensors; Photoelasticity; Semiconductor lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2000. (CLEO 2000). Conference on
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    1-55752-634-6
  • Type

    conf

  • DOI
    10.1109/CLEO.2000.907401
  • Filename
    907401