DocumentCode :
2930195
Title :
Impact of electrical degradation on trapping characteristics of GaN high electron mobility transistors
Author :
Joh, Jungwoo ; del Alamo, Jesús A.
Author_Institution :
Microsyst. Technol. Labs., MIT, Cambridge, MA
fYear :
2008
fDate :
15-17 Dec. 2008
Firstpage :
1
Lastpage :
4
Abstract :
One of the most deleterious effects of electrical degradation of GaN HEMTs is an increase in carrier trapping and subsequent current collapse. In this work, we have investigated the trapping and detrapping characteristics of GaN HEMTs before and after device degradation through a new current transient analysis methodology. We have found that electrical stress beyond a critical voltage significantly enhances trapping behavior inside the AlGaN barrier layer or at the surface. However, trapping in the buffer was found to be intact after device degradation.
Keywords :
III-V semiconductors; aluminium compounds; electron traps; gallium compounds; high electron mobility transistors; transient analysis; wide band gap semiconductors; AlGaN; carrier trapping; current collapse; current transient analysis; device degradation; electrical degradation; high electron mobility transistors; Aluminum gallium nitride; Degradation; Electron traps; Gallium nitride; HEMTs; MODFETs; Pulse measurements; Temperature; Transient analysis; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2008. IEDM 2008. IEEE International
Conference_Location :
San Francisco, CA
ISSN :
8164-2284
Print_ISBN :
978-1-4244-2377-4
Electronic_ISBN :
8164-2284
Type :
conf
DOI :
10.1109/IEDM.2008.4796725
Filename :
4796725
Link To Document :
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