Highly reliable CMOS-integrated 11MPixel SiGe-based micro-mirror arrays for high-end industrial applications

In this paper we report for the first time on the fabrication of very reliable CMOS-integrated 10 cm² 11 MPixel SiGe-based micro-mirror arrays on top of 6 level metal CMOS wafers. The array, which is to be used as Spatial Light Modulator (SLM) for optical maskless lithography [1,2,3] consists of 8 mum x 8 mum pixels which can be individually addressed by an analog voltage to enable accurate tilt angle modulation. The pixel density is almost double compared to the state-of-the-art [4]. A stable average cupping below 7 nm, an RMS roughness below 1 nm and long lifetime (>10¹² cycles, no creep [5]) are demonstrated.